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Single-photon avalanche diodes (SPADs) that are sensitive to photons in the Short-wave infrared and extended short-wave infrared (SWIR and eSWIR) spectra are important components for communication, ranging, and low-light level imaging. The high gain, low excess noise factor, and widely tunable bandgap of Al_xIn_1-xAs_ySb_1-yavalanche photodiodes (APDs) make them a suitable candidate for these applications. In this work, we report single-photon-counting results for a separate absorption, charge, and multiplication (SACM) Geiger-mode SPAD within a gated-quenching circuit. The single-photon avalanche probabilities surpass 80% at 80 K, corresponding with single-photon detection efficiencies of 33% and 12% at 1.55 µm and 2 µm, respectively.

 

We present a transient response study of a semiconductor based plasmonic switch. The proposed device operates through active control and modulation of localized electron density waves, i.e., surface plasmon polaritons (SPPs) at degenerately doped In_0.53Ga_0.47As based PN⁺⁺junctions. A set of devices is designed and fabricated, and its optical and electronic behaviors are studied both experimentally and theoretically. Optical characterization shows far-field reflectivity modulation, a result of electrical tuning of the SPPs at the PN⁺⁺junctions for mid-IR wavelengths, with significant 3 dB bandwidths. Numerical studies using a self-consistent electro-optic multi-physics model are performed to uncover the temporal response of the devices’ electromagnetic and kinetic mechanisms facilitating the SPP switching at the PN⁺⁺junctions. Numerical simulations show strong synergy with the experimental results, validating the claim of potential optoelectronic switching with a 3 dB bandwidth as high as 2 GHz. Thus, this study confirms that the presented SPP diode architecture can be implemented for high-speed control of SPPs through electrical means, providing a pathway toward fast all-semiconductor plasmonic devices.

 

Highly mismatched semiconductor alloys (HMAs) offer unusual combinations of bandgap and lattice constant, which are attractive for myriad applications. Dilute borides, such as BGa(In)As, are typically assumed to be HMAs. BGa(In)As can be grown in higher alloy compositions than Ga(In)NAs with comparable bandgaps, potentially enabling routes to lattice-matched telecom lasers on Si or GaAs. However, BGa(In)As remains relatively unexplored, especially with large fractions of indium. Density functional theory with HSE06 hybrid functionals was employed to study BGaInAs with 4%–44% In and 0%–11% B, including atomic rearrangement effects. All compositions showed a direct bandgap, and the character of the lowest conduction band was nearly unperturbed with the addition of B. Surprisingly, although the bandgap remained almost constant and the lattice constant followed Vegard's law with the addition of boron, the electron effective mass increased. The increase in electron effective mass was higher than in conventional alloys, though smaller than those characteristics of HMAs. This illustrates a particularly striking finding, specifically that the compositional space of BGa(In)As appears to span conventional alloy and HMA behavior, so it is not well-described by either limit. For example, adding B to GaAs introduces additional states within the conduction band, but further addition of In removes them, regardless of the atomic arrangement. 

Tensile-strained pseudomorphic Ge 1–x–y Sn x C y was grown on GaAs substrates by molecular beam epitaxy using carbon tetrabromide (CBr 4 ) at low temperatures (171–258 °C). High resolution x-ray diffraction reveals good crystallinity in all samples. Atomic force microscopy showed atomically smooth surfaces with a maximum roughness of 1.9 nm. The presence of the 530.5 cm −1 local vibrational mode of carbon in the Raman spectrum verifies substitutional C incorporation in Ge 1–x–y Sn x C y samples. X-ray photoelectron spectroscopy confirms carbon bonding with Sn and Ge without evidence of sp 2 or sp 3 carbon formation. The commonly observed Raman features corresponding to alternative carbon phases were not detected. Furthermore, no Sn droplets were visible in scanning electron microscopy, illustrating the synergy in C and Sn incorporation and the potential of Ge 1–x–y Sn x C y active regions for silicon-based lasers. 

Band gap alignments of BGaInAs/GaAs quantum wells with mole fractions of indium around 40% and mole fractions of boron ranging from 0% up to 4.75% are studied experimentally by photoreflectance (PR) and photoluminescence (PL). Obtained results are explained within ak · pmodel within an envelope function approximation. The study shows an increase of the valence band offset with an addition of boron into the thin film at a rate of around 4.2% per 1% of boron incorporated. Non-zero bowing parameters of valence band offsets for ternary alloys with boron (BGaAs and BInAs) are estimated. Moreover, it was observed that unlike in other highly mismatched alloy systems the incorporation of boron does not significantly deteriorate the optical quality of the studied samples, i.e., the broadening of optical transitions observed in PR and PL is very comparable to that observed for the reference QW, and the PL properties of boron containing QWs are similar to the reference boron free QW. Some deterioration of optical quality due to the increased alloy inhomogeneity is observed only for the sample with the highest concentration of B (4.2%).

 

Optoelectronic devices in the mid-infrared have attracted significant interest due to numerous potential applications in communications and sensing. Molecular beam epitaxial (MBE) growth of highly doped InAs has emerged as a promising “designer metal” platform for the plasmonic enhancement of mid-infrared devices. However, while typical plasmonic materials can be patterned to engineer strong localized resonances, the lack of lateral control in conventional MBE growth makes it challenging to create similar structures compatible with monolithically grown plasmonic InAs. To this end, we report the growth of highly doped InAs plasmonic ridges for the localized resonant enhancement of mid-IR emitters and absorbers. Furthermore, we demonstrate a method for regaining a planar surface above plasmonic corrugations, creating a pathway to epitaxially integrate these structures into active devices that leverage conventional growth and fabrication techniques. 

We report the frequency response of Al_0.3InAsSb/Al_0.7InAsSb nBn photodetectors. The 3-dB bandwidth of the devices varies from ∼ 150 MHz to ∼ 700 MHz with different device diameters and saturates with bias voltage immediately after the device turn on. A new equivalent circuit model is developed to explain the frequency behavior of nBn photodetectors. The simulated bandwidth based on the new equivalent circuit model agrees well with the bandwidth and the microwave scattering parameter measurements. The analysis reveals that the limiting factor of the bandwidth of the nBn photodetector is the large diffusion capacitance caused by the minority carrier lifetime and the device area. Additionally, the bandwidth of the nBn photodetector is barely affected by the photocurrent, which is found to be caused by the barrier structure in the nBn photodetector.